00000nam 2200000zi 4500 9.879914 CaOODSP 20240219183517 m o d f cr cn||||||||| 190930t20132013quca ob f000 0 eng d CaOODSP eng rda CaOODSP eng eng fre D68-6/270-2013E-PDF Paradis, Suzanne, author. Characterization and optimization of SiO2 and Si3N4 thin films : for a smart uncooled IR sensor / Suzanne Paradis, DRDC Valcartier ; Jean-Baptiste A. Keptsu, Plasmionique Inc. Quebec (Quebec) : Defence R&D Canada - Valcartier, 2013. ©2013 1 online resource (viii, 32 pages, 2 unnumbered pages) : colour illustrations. text txt rdacontent computer c rdamedia online resource cr rdacarrier Technical memorandum ; DRDC Valcartier TM 2012-270 "February 2013." Includes bibliographical references (pages 24-25). "This document reports on the characterization and optimization of two thin films, namely silicon oxide and silicon nitride, that are used in the fabrication of the smart uncooled IR sensor with wavelength selectivity. These thin films play an important role in the stack of films forming the sensor. In the course of the fabrication of the sensor, the films were found not to be optimized to play their function. Their stoichiometry and physical properties such as density, absorptance, optical constants, and residual stress were characterized and optimized with a view to maximizing the performance of the optical device"--Abstract, page i. Includes abstracts and summaries in English and French. Keptsu, Jean-Baptiste A., author. Defence R&D Canada. Defence R&D Canada - Valcartier. Technical memorandum (Defence R&D Canada) DRDC Valcartier TM 2012-270. (CaOODSP)9.820564 PDF 1.28 MB https://publications.gc.ca/collections/collection_2019/rddc-drdc/D68-6-270-2013-eng.pdf